3n High Purity Crsi Chromium-Silicon Sputtering Target Flat Plate / Chromium-Silicon Rotating Targets

• Application: Industrial
• Formula: Chromium-Silicon
• Classification: Alloy Traget
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Model NO.: CYT-CrSi
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

PRODUCT DESCRIPTION

The chromium-silicon rotating target is made using a spraying process, and can produce a maximum length of 4000mm, with thickness and proportions customized according to customer requirements.

The chromium-silicon flat target is made of high-purity silicon, intermediate alloys obtained by melting and casting chromium, and then finely crushed into powder. After careful mixing, encapsulation, vacuuming, and hot isostatic pressing, a CrSi ingot is obtained, which is then processed through
Mechanically processed, with sizes and proportions customized according to customer requirements.
Technical Parameters
Purity: 99.9-99.99%
Application fields: thin film solar energy industry, low-emissivity glass industry, tool and decoration coating industry.
We can make flat chromium-silicon and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 3N high-purity chromium-silicon as below:

Targets Specification
Application	PVD sputtering materials
Material	chromium-silicon
Purity	3N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	-g/cm3
Melting Point	-ºC
Produce method	melting and mixing

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray