99.999% High Purity Al Aluminum Sputtering Target Plate /Al Aluminum Metal Target

• Application: Industrial
• Formula: Aluminum
• Classification: Metal Traget
• Model NO.: CYT-Al
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

Aluminum is a silver-white metal which are very light and has good ductility, electrical conductivity, thermal conductivity, heat resistance and radiation resistance. There is always a oxidized aluminum on the surface of aluminum, because aluminum is very easy to get oxidation in the air which give aluminum good corrosion resistance.
Because aluminum has good performance and abundant in quantity, it is often made into rods, sheets, foils, powders, ribbons and filaments which is widely used in important industrial fields such as aviation, construction, automobiles, and electric power.
Aluminum targets are mainly used in the thin film solar industry, low-e glass industry, flat panel display industry, optical coating industry, tool and decorative coating industry, and high-purity aluminum targets are mostly used in chip manufacturing and advanced packaging.
We can make flat Ni targets and rotary sputtering targets.
The description composition analysis table of 4N5 high-purity Nickel target as below:

Targets Specification
Application	PVD sputtering materials
Material	Aluminum
Purity	4N5
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	2.7g/cm3
Melting Point	660ºC
Produce method	HIP

 

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al	3N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP,Smelting
Cu	4N	-	8.9	1084	400	16.5	Smelting
Ni	3N5	-	4.5	1453	90	13	Smelting
Ti	3N	-	4.5	1668	15.2	9.4	Smelting
Zr	3N	-	6.49	1852	0.227	-	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
Ag	4N	-	10.49	961.93	429	19	Smelting
C	4N	-	2.23	3850±50	151	-	HIP
TiAl	3N5	AS REQUESTED	-	-	-	-	Smelting
InSn	4N	AS REQUESTED	-	-	-	-	Casting
CrSi	4N	AS REQUESTED	-	-	-	-	Spray
CrW	4N	AS REQUESTED	16.7	3017	57	6.3	HIP
NiCr	3N	AS REQUESTED	-	-	-	-	Smelting
WC	3N	AS REQUESTED	15.77	2870	110	5.5	Sintering&Spray
NbOx	4N	AS REQUESTED	4.6	1460	5	1.5	Sintering&Spray