3n, 80/20crwt%, 60/40 Cr Wt% Nickel-Chromium Rotating Targets

• Application: Industrial
• Formula: Nicr
• Classification: Alloy Targets
• Certification: ISO,SGS
• Grade Standard: Industrial Grade
• Shape: Rotary,Flat,Round
• Model NO.: CYT-NiCR
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

Nickel-chromium rotating targets are made by vacuum melting process as well as hot or cold spraying process.
Nickel-chromium flat targets are produced by vacuum melting, rolling, machining and other processes

Nickel-chromiumTargets Specification
Application	PVD sputtering materials
Material	Nickel-chromium
Purity	3N,80/20Crwt%,60/40 Cr wt%,etc
Size	customized
Thickness	customized
Shape	Rotary  sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	8.4g/cm3
Melting Point	3547ºC
Produce method	HIP

Our Advantage

Operation Process
Application:
Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al	3N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP,Smelting
Cu	4N	-	8.9	1084	400	16.5	Smelting
Ni	3N5	-	4.5	1453	90	13	Smelting
Ti	3N	-	4.5	1668	15.2	9.4	Smelting
Zr	3N	-	6.49	1852	0.227	-	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
Ag	4N	-	10.49	961.93	429	19	Smelting
C	4N	-	2.23	3850±50	151	-	HIP
TiAl	3N5	AS REQUESTED	-	-	-	-	Smelting
InSn	4N	AS REQUESTED	-	-	-	-	Casting
CrSi	4N	AS REQUESTED	-	-	-	-	Spray
CrW	4N	AS REQUESTED	16.7	3017	57	6.3	HIP
NiCr	3N	AS REQUESTED	-	-	-	-	Smelting
NiV	3N	97:3	-	-	-	-	Smelting
WC	3N	-	15.77	2870	110	5.5	Sintering&Spray
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray