3n High Purity Nickel-Vanadium Sputtering Target Flat Plate / Rotating Targets

• Application: Industrial
• Formula: Nickel-Vanadium
• Classification: Alloy Traget
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Model NO.: CYT-NiV
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

PRODUCT DESCRIPTION

The nickel-vanadium rotating target is obtained by repeatedly vacuum melting or vacuum smelting high-purity nickel-vanadium ingots, and then fabricated through forging, rolling, machining, etc. The size is customized according to customer requirements.

The nickel-vanadium plane target is obtained by repeatedly vacuum melting or vacuum smelting high-purity nickel-vanadium ingots, which are then subjected to hot isostatic pressing, followed by forging, annealing, rolling, machining, and other processes.

The resulting blank has uniform internal structure, fine grain size, and no internal defects, which meets the requirements of semiconductor nickel vanadium target blanks. The size is customized according to customer requirements.

Technical parameters

Purity: 99.95%; common ratio: 93-7V wt%.

Application fields: electronics and information, integrated circuits, displays and other industries.
We can make flat nickel-vanadium and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 3N high-purity nickel-vanadium as below:

Targets Specification
Application	PVD sputtering materials
Material	nickel-vanadium
Purity	3N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	-g/cm3
Melting Point	-ºC
Produce method	HIP

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray