• 99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target
  • 99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target
  • 99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target

99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target

Application: Industrial
Formula: Nickel
Classification: Metal Traget
Grade Standard: Industrial Grade
Certification: ISO
Shape: Rotary,Flat,Round
Gold Member Since 2023

Suppliers with verified business licenses

Guangdong, China
to see all verified strength labels (14)

Basic Info.

Model NO.
CYT-Ni
Transport Package
Wooden Box
Specification
Customized Size
Trademark
CANYUAN
Origin
China
Production Capacity
1000PCS

Product Description


 
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target
Nickel is a silver-white metal and is very easily oxidized in the air. After Oxidation, there will be black oxide film on the surface. So it will be always look like black colors. Nickel can be highly polished and it is hard, very malleable, magnetic and corrosion-resistant material. Nickel is often used in the manufacturing of stainless steel, alloy structural steel and other steel fields, electroplating, high-nickel-based alloys and batteries. It is widely used in various military manufacturing industries such as aircraft and radar, civil machinery manufacturing and vacuum coating industries.

Nickel targets are mainly used in the semiconductor, microelectronics and decorative coating industries and are key materials for semiconductor back electrodes. The highest purity of the nickel targets we produce can reach 99.999%, and its grain structure is ultra-fine and uniform.
We can make flat Ni targets and rotary sputtering targets.
The description composition analysis table of 4N5 high-purity Nickel target as below:

 
  Targets Specification
Application PVD sputtering materials
Material Nickel
Purity 5N
Size customized
Thickness customized
Shape Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density 8.9g/cm3
Melting Point 1455ºC
Produce method HIP
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target

Our Advantage
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target


Operation Process
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target

Packing Picture
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target


Application:
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target
99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target

Relating Product
Material Purity
(N)
Components
(wt%)
Density Melting
 Point
Thermal
Conductivity
(Wm-1K-1)
Coefficient of
 expansion
(10-6k-1)
Production
 Process
Al 3N - 2.7 660 235 23.1 Smelting
Cr 3N5 - 7.22 1907 94 4.9 HIP,Smelting
Cu 4N - 8.9 1084 400 16.5 Smelting
Ni 3N5 - 4.5 1453 90 13 Smelting
Ti 3N - 4.5 1668 15.2 9.4 Smelting
Zr 3N - 6.49 1852 0.227 - Smelting
Si 4N - 2.33 1414 150 2.6 Sintering&Spray
Ag 4N - 10.49 961.93 429 19 Smelting
C 4N - 2.23 3850±50 151 - HIP
TiAl 3N5 AS REQUESTED - - - - Smelting
InSn 4N AS REQUESTED - - - - Casting
CrSi 4N AS REQUESTED - - - - Spray
CrW 4N AS REQUESTED 16.7 3017 57 6.3 HIP
NiCr 3N AS REQUESTED - - - - Smelting
WC 3N AS REQUESTED 15.77 2870 110 5.5 Sintering&Spray
NbOx 4N AS REQUESTED 4.6 1460 5 1.5 Sintering&Spray

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now

You Might Also Like

Gold Member Since 2023

Suppliers with verified business licenses

Manufacturer/Factory
Main Products
Sputtering Target
Number of Employees
6