Titanium Target for Thin Film Deposition in Cutting-Edge Technologies

• Shape: Rotary,Flat,Round
• Certification: ISO
• Formula: Titanium
• Model NO.: CYT-TI
• Classification: Metal Traget
• Grade Standard: Industrial Grade
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

The titanium target has some excellent characteristics of titanium itself, such as excellent corrosion resistance, high strength and low density, as well as good biocompatibility, high temperature resistance and so on.
In addition, because the titanium target is "struck" during the film deposition process to produce titanium atoms, its surface quality has a great influence on the quality of the deposited titanium film.

Therefore, titanium targets usually need to be polished to achieve a surface that is sufficiently flat and free of microscopic cracks and impurities.
In this way, high sputtering rate and high purity of the film can be guaranteed during used.

Titanium target is mainly used for sputtering coating, which can deposit a layer of film on the surface of various materials to improve their physical and chemical properties. 
Titanium target also has good electrical conductivity and magnetic properties, and can be used for making various electronic devices and components.
 

Titanium  Targets Specification
Application	PVD sputtering materials
Material	Titanium
Purity	Titanium
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	4.5g/cm3
Melting Point	1668ºC
Produce method	HIP-pp

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al	3N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP,Smelting
Cu	4N	-	8.9	1084	400	16.5	Smelting
Ni	3N5	-	4.5	1453	90	13	Smelting
Ti	3N	-	4.5	1668	15.2	9.4	Smelting
Zr	3N	-	6.49	1852	0.227	-	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
Ag	4N	-	10.49	961.93	429	19	Smelting
C	4N	-	2.23	3850±50	151	-	HIP
TiAl	3N5	AS REQUESTED	-	-	-	-	Smelting
InSn	4N	AS REQUESTED	-	-	-	-	Casting
CrSi	4N	AS REQUESTED	-	-	-	-	Spray
CrW	4N	AS REQUESTED	16.7	3017	57	6.3	HIP
NiCr	3N	AS REQUESTED	-	-	-	-	Smelting
NiV	3N	97:3	-	-	-	-	Smelting
WC	3N	-	15.77	2870	110	5.5	Sintering&Spray
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray