99.95% High Purity Pd Palladium Sputtering Target Plate / Pd Palladium Metal Target

• Application: Industrial
• Formula: Palladium
• Classification: Metal Traget
• Model NO.: CYT-Pd
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

Palladium is a silver-white transition metal. It is soft, has good ductility and plasticity which can be forged, rolled and drawn.
Palladium is an indispensable key material in high-tech fields such as aerospace and aviation, as well as in the automobile manufacturing industry. It is also an investment species that cannot be ignored in the international precious metal investment market. Palladium is mainly used as a catalyst in chemistry and is also used in the manufacture of dental materials, watches and surgical instruments.
Palladium sputtering materials can be used in thin film coating, CD-ROM, decoration, flat panel displays, functional coating, and other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, optical communications, etc. Other major applications of palladium metal include use as catalytic converters, a key catalyst in polyester production, eliminating harmful emissions from internal combustion engines,  developing raw materials for synthetic rubber and nylon.
We can make palladium wires, palladium particles, palladium sputtering targets, etc.
 

Targets Specification
Application	PVD sputtering materials
Material	Palladium
Purity	4N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	7.28g/cm3
Melting Point	22600ºC
Produce method	casting

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Operation Process

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Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray