99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target

• Application: Industrial
• Formula: Rhodium
• Classification: Metal Traget
• Model NO.: CYT-Rh
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

Rhodium is a silver-white and hard metal. Rhodium is a platinum group element with high reflectivity. Rhodium metal usually does not get oxidation. Melting rhodium will absorb oxygen, but release it during solidification. The melting point of rhodium is higher than that of platinum, and its density is lower than that of platinum. Rhodium does not dissolve in most acids. Rhodium is mainly used as rhodium catalysts, rhodium alloys, rhodium coatings, rhodium compounds in the fields of chemistry, petroleum, glass, electronics, dentistry, jewelry, automobiles and so on.

Rhodium sputtering materials can be used for thin film coating, CD-ROM, decoration, flat panel displays, functional coatings, as well as other optical information storage industries, glass coating industries such as automotive glass and architectural glass, optical communication and so on. The main application of rhodium metal in the automotive industry is being use  as a catalytic converter to convert harmful unburned hydrocarbon and nitrogen oxide emissions into harmless gases. It is also used in the glass industry to produce flat glass and glass fibers.


We can make rhodium into rhodium wire, rhodium particles, rhodium sputtering targets, etc.;  
The purity and specifications can be customized.
Also rhodium target materials also include platinum-rhodium alloys.
The description composition analysis table of 4N high-purity Rhodium target as below:

Targets Specification
Application	PVD sputtering materials
Material	Rhodium
Purity	3N5
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	7.28g/cm3
Melting Point	22600ºC
Produce method	casting

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Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray