Customized Size High Purity Carbon Graphite Sputtering Targets 99.99% Bonding Copper Target

• Application: Industrial
• Formula: Carbon
• Classification: Ceramic Target
• Model NO.: CYT-C
• Certification: ISO
• Shape: Rotary ,Flat,Round
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

Graphite targets are mainly made through the carbonization process.
First, different materials (such as graphite, ceramics, etc.) are carbonized into graphite at high temperatures and then made into target materials. The main characteristics of graphite targets are excellent physical and chemical properties such as high purity, high density and good electrical conductivity.

Specification
Application	PVD sputtering materials
Material	Graphite Targets
Purity	99.9%~99.999%,3N,3N5,4N,5N,etc
Size	customized
Thickness	customized
Shape	Pellets, Granules, Planar, Round, Plate, Rotary, Bar , According to customer request
Density	3.51g/cm3
Melting Point	3547ºC
Produce method	HIP

Our Advantage

Operation Process
Application:
Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al	3N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP,Smelting
Cu	4N	-	8.9	1084	400	16.5	Smelting
Ni	3N5	-	4.5	1453	90	13	Smelting
Ti	3N	-	4.5	1668	15.2	9.4	Smelting
Zr	3N	-	6.49	1852	0.227	-	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
Ag	4N	-	10.49	961.93	429	19	Smelting
C	4N	-	2.23	3850±50	151	-	HIP
TiAl	3N5	AS REQUESTED	-	-	-	-	Smelting
InSn	4N	AS REQUESTED	-	-	-	-	Casting
CrSi	4N	AS REQUESTED	-	-	-	-	Spray
CrW	4N	AS REQUESTED	16.7	3017	57	6.3	HIP
NiCr	3N	AS REQUESTED	-	-	-	-	Smelting
NiV	3N	97:3	-	-	-	-	Smelting
WC	3N	-	15.77	2870	110	5.5	Sintering&Spray
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray