4n Alumina Target Al2O3 Target, Alumimium Oxide Rotary Targets/Flat Targets

• Application: Industrial
• Formula: Alumimium Oxide
• Classification: Ceramic Traget
• Model NO.: CYT-AL2O3
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

PRODUCT DESCRIPTION

Alumina target materials are obtained by vacuum hot pressing and atmosphere sintering processes to obtain alumina target blanks, which are then machined to produce the final target. Rotating targets are typically bound to a backing tube for use, while flat targets are used in vacuum sintering processes.

It is recommended to use the surface target attached to a copper backplane, and the size can be customized according to customer requirements.

Technical parameters

Purity: 99.99%.

Application areas: mechanical equipment, optical field, microelectronics field, semiconductor.
We can make flat AL2O3 and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 4N AL2O3 as below:

Targets Specification
Application	PVD sputtering materials
Material	Al2O3 ( Alumimium oxide)
Purity	4N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	-g/cm3
Melting Point	-ºC
Produce method	HIP

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray