| Application: | Industrial |
|---|---|
| Formula: | Chromium |
| Classification: | Metal Traget |
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Chromium target is a material made of chromium (Cr) which can be deposited on the surface of the substrate to change the surface properties of the substrate.
| Chromium Targets Specification | |
| Application | PVD sputtering materials |
| Material | Chromium |
| Purity | 3N5 |
| Size | customized |
| Thickness | customized |
| Shape | Rotary Chromium sputtering Target, Ring type, sheet type, Plat type and Tube type |
| Density | 7.19g/cm3 |
| Melting Point | 1907ºC |
| Produce method | HIP |
| Material | Purity (N) |
Components (wt%) |
Density | Melting Point |
Thermal Conductivity (Wm-1K-1) |
Coefficient of expansion (10-6k-1) |
Production Process |
| Al | 3N | - | 2.7 | 660 | 235 | 23.1 | Smelting |
| Cr | 3N5 | - | 7.22 | 1907 | 94 | 4.9 | HIP,Smelting |
| Cu | 4N | - | 8.9 | 1084 | 400 | 16.5 | Smelting |
| Ni | 3N5 | - | 4.5 | 1453 | 90 | 13 | Smelting |
| Ti | 3N | - | 4.5 | 1668 | 15.2 | 9.4 | Smelting |
| Zr | 3N | - | 6.49 | 1852 | 0.227 | - | Smelting |
| Si | 4N | - | 2.33 | 1414 | 150 | 2.6 | Sintering&Spray |
| Ag | 4N | - | 10.49 | 961.93 | 429 | 19 | Smelting |
| C | 4N | - | 2.23 | 3850±50 | 151 | - | HIP |
| TiAl | 3N5 | AS REQUESTED | - | - | - | - | Smelting |
| InSn | 4N | AS REQUESTED | - | - | - | - | Casting |
| CrSi | 4N | AS REQUESTED | - | - | - | - | Spray |
| CrW | 4N | AS REQUESTED | 16.7 | 3017 | 57 | 6.3 | HIP |
| NiCr | 3N | AS REQUESTED | - | - | - | - | Smelting |
| NiV | 3N | 97:3 | - | - | - | - | Smelting |
| WC | 3N | - | 15.77 | 2870 | 110 | 5.5 | Sintering&Spray |
| NbOx | 4N | - | 4.6 | 1460 | 5 | 1.5 | Sintering&Spray |
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