99.95% High Purity IR Iridiu Sputtering Target Plate / IR Iridiu Metal Target

• Application: Industrial
• Formula: Iridium
• Classification: Metal Traget
• Model NO.: CYT-IR
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

Iridium is white like platinum, with a little yellowish tint. Iridium is hard and fragile,  its melting point is very high, so it is difficult to cast and plasticize. Therefore, the manufacturing process generally uses powder metallurgy. Iridium is the only metal that still maintains excellent mechanical properties in air above 1600 °C. Its boiling point is extremely high, ranking 10th among all elements. Iridium is one of the most corrosion-resistant metals. It can withstand almost all acids, aqua regia, molten metal's, and even silicates at high temperatures.

Iridium sputtering targets are used for thin film deposition and are typically used in fuel cells, decoration, semiconductors, displays, LEDs, and photovoltaic equipment, glass coating, etc.

Iridium materials include iridium wire, iridium particles, iridium sputtering targets, etc.; purity and specifications can be customized. Other alloy forms of iridium targets include iridium rhodium, iridium platinum alloys, etc.
The following figure is a chemical composition analysis table of 3N5 high purity iridium target:

Other applications of iridium:

1.Hardening agent for special alloys;
2.Rhodium-iridium alloy can be used to make high-temperature thermocouples;
3.Iridium-tungsten alloy can be used as high-temperature spring materials;
4.Iridium crucible, instrument parts, metal wires for high-temperature vacuum instruments, electrical contacts, etc.;
5.Used as a catalyst for reactions such as hydrogenation, deoxygenation, and oxidation;
6.Iridium films are used as protective films or heavy-duty electrical contacts.

Targets Specification
Application	PVD sputtering materials
Material	Iridium
Purity	3N5
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	21.45g/cm3
Melting Point	1772ºC
Produce method	Powder

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Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray