99.999% High Purity Tantalum Ta Sputtering Target Plate /Tantalum Ta Metal Target

• Application: Industrial
• Formula: Tantalum
• Classification: Metal Traget
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Model NO.: CYT-TA
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

Pure tantalum has a slightly blue color and excellent ductility. It can be rolled into very thin (less than 0.01 mm) plates without intermediate annealing in the cold state. The corrosion resistance of tantalum is the same as that of glass. Metal tantalum is stable in air at room temperature. When heated to above 500°C, oxidation and become form Ta205. Tantalum has a series of excellent properties such as high melting point, low vapor pressure, good cold working performance, high chemical stability, strong resistance to liquid metal corrosion, and large dielectric constant of surface oxide film. It is widely used in electronics, metallurgy, steel, chemical industry, cemented carbide, It has important applications in high-tech fields such as atomic energy, superconducting technology, automotive electronics, aerospace, medical and health care, and scientific research.
Tantalum targets are mainly used in semiconductor coatings and optical coatings.
Tantalum targets can be made in planar and rotating types, specifications and purity can be customized. The picture below is the composition analysis table of 3N5 high-purity tantalum target:

 

Targets Specification
Application	PVD sputtering materials
Material	Tantalum
Purity	3N5
Size	customized
Thickness	customized
Shape	Rotary Chromium sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	16.68g/cm3
Melting Point	2980ºC
Produce method	HIP

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Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray