3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets

Product Details
Application: Industrial
Formula: Chrome-Aluminum
Classification: Alloy Traget
Gold Member Since 2023

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  • 3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets
  • 3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets
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Basic Info.

Model NO.
CYT-CrAl
Grade Standard
Industrial Grade
Certification
ISO
Shape
Rotary,Flat,Round
Transport Package
Wooden Box
Specification
Customized Size
Trademark
CANYUAN
Origin
China
Production Capacity
1000PCS

Product Description

3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets

The chrome-aluminum rotating target is produced using spraying or hot isostatic pressing processes, and can produce a maximum length of 4000mm, with thickness and proportions customized according to customer requirements.

The chromium-aluminum flat target is produced using hot isostatic pressing technology, which has the advantages of fine and uniform grain size and long service life. It can produce targets with a maximum length of 1600mm and a maximum width of 400mm, with dimensions and proportions based on customer requirements.

Customized according to customer requirements.

Technical parameters

Purity: 99.8-99.95%; common ratio: 90:10at%, 75:25at%, 50:50at%, etc.

Application areas: Coating of hard alloy cutting tools and heat treatment molds to improve the wear resistance and service temperature of the coating layer.

 

We can make flat chromium-tungsten and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 3N high-purity
chromium-titanium as below:
 Targets Specification
Application PVD sputtering materials
Material chrome-aluminum
Purity 3N
Size customized
Thickness customized
Shape Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density -g/cm3
Melting Point -ºC
Produce method HIP
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets

Our Advantage
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets


Operation Process
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets

Packing Picture
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets


Application:
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets
3n, High Purity Chrome-Aluminum Sputtering Target Flat Plate /Chrome-Aluminum Rotating Targets

Relating Product
Material Purity
(N)
Components
(wt%)
Density Melting
 Point
Thermal
Conductivity
(Wm-1K-1)
Coefficient of
 expansion
(10-6k-1)
Production
 Process
Al-Alloy 5N - 2.7 660 235 23.1 Smelting
Cr 3N5 - 7.22 1907 94 4.9 HIP
Cu 4N - 8.9 1084 400 16.5 Smelting
Mo-alloy 3N5 - 10.28 2623 139 4.8 HIP
Nb 4N - 8.6 2477 54 7.3 Smelting
Ta 4N - 16.7 3017 57 6.3 Smelting
Si 4N - 2.33 1414 150 2.6 Sintering&Spray
TI 5N - 4.5 1670 22 8.6 Smelting
W 4N - 19.25 3422 174 4.5 HIP
AZO 3N5 98:2 5.6 1975 22 1.5 Sintering
ITO 4N 90:10 7.15 2000 15 2.0 Sintering
GZO 3N5 AS REQUESTED 7.15 - - - Sintering
IGZO 4N AS REQUESTED - - - - Sintering
NbOx 4N - 4.6 1460 5 1.5 Sintering&Spray
TIOx 4N - 4.23 1800 4 7.14 Sintering&Spray
 

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