99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target

Product Details
Application: Industrial
Formula: Ruthenium
Classification: Metal Traget
Gold Member Since 2023

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  • 99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target
  • 99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target
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Basic Info.

Model NO.
CYT-Ru
Grade Standard
Industrial Grade
Certification
ISO
Shape
Rotary,Flat,Round
Transport Package
Wooden Box
Specification
Customized Size
Trademark
CANYUAN
Origin
China
Production Capacity
1000PCS

Product Description


 
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target
Ruthenium, also known as Ru, is a hard, brittle, light gray multivalent rare metal element. It is a member of the platinum group of metals and is one of the rarest metals in the earths. Ruthenium is very stable and highly corrosion resistant. Ruthenium has excellent catalytic activity, good electrical conductivity, high temperature resistance, and corrosion resistance. Currently, most ruthenium is used in the production of perpendicular recording hard disks, and is also widely used in the electronics industry, chemical industry, electrochemical industry, and other high-tech fields.

Ruthenium target materials are generally used as elemental additives in the manufacture of nickel-based high-temperature alloys for aviation and industrial gas turbines.

Ruthenium materials we can make include ruthenium wire, ruthenium particles, platinum sputtering targets, etc.
The specifications and purity can be customized.
The composition analysis table of 3N5 high-purity ruthenium target as below;
 Targets Specification
Application PVD sputtering materials
Material Ruthenium 
Purity 3N5
Size customized
Thickness customized
Shape Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density 21.45g/cm3
Melting Point 1772ºC
Produce method casting
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target


Our Advantage
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target


Operation Process
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target

Packing Picture
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target


Application:
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target
99.95% High Purity Ru Ruthenium Sputtering Target Plate / Ru Ruthenium Metal Target

Relating Product
Material Purity
(N)
Components
(wt%)
Density Melting
 Point
Thermal
Conductivity
(Wm-1K-1)
Coefficient of
 expansion
(10-6k-1)
Production
 Process
Al-Alloy 5N - 2.7 660 235 23.1 Smelting
Cr 3N5 - 7.22 1907 94 4.9 HIP
Cu 4N - 8.9 1084 400 16.5 Smelting
Mo-alloy 3N5 - 10.28 2623 139 4.8 HIP
Nb 4N - 8.6 2477 54 7.3 Smelting
Ta 4N - 16.7 3017 57 6.3 Smelting
Si 4N - 2.33 1414 150 2.6 Sintering&Spray
TI 5N - 4.5 1670 22 8.6 Smelting
W 4N - 19.25 3422 174 4.5 HIP
AZO 3N5 98:2 5.6 1975 22 1.5 Sintering
ITO 4N 90:10 7.15 2000 15 2.0 Sintering
GZO 3N5 AS REQUESTED 7.15 - - - Sintering
IGZO 4N AS REQUESTED - - - - Sintering
NbOx 4N - 4.6 1460 5 1.5 Sintering&Spray
TIOx 4N - 4.23 1800 4 7.14 Sintering&Spray
 

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