99.99% High Purity PT Platinum Sputtering Target Plate /PT Platinum Metal Target

• Application: Industrial
• Formula: Platinum
• Classification: Metal Traget
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Model NO.: CYT-PT
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

Platinum is one of the precious metals. It is soft and has good ductility, thermal conductivity and electrical conductivity.
Platinum is the most important and widely used metal among the platinum group metals. Platinum materials mainly used in chemical vessels, platinum crucibles, electrodes, catalysts, thermocouples, accessing material to medical equipment, etc. The purity of platinum used in thermocouples and pyrometers must be more than 99.999%.
Platinum sputtering targets are mainly used in thin film coating applications, such as CD-ROM, decoration, flat panel displays, functional coatings, and other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, optical communication industries, etc.
Platinum evaporates in vacuum condition and is used in the manufacture of semiconductors, fuel cells and batteries. It is also used as a layer in optical coatings.
We can make platinum particles, platinum sputtering targets, electron microscope platinum sheets, platinum tin-plated sheets, etc.
Dimension and purity of platinum can be customized.
The composition analysis table of 4N5 high-purity silver target as below:

Targets Specification
Application	PVD sputtering materials
Material	Platinum
Purity	4N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	21.45g/cm3
Melting Point	1772ºC
Produce method	casting

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Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray