3n, 80/20 Cr Wt%, 60/40 Cr Wt% Nickel-Chromium Rotating Targets

• Application: Industrial
• Formula: Nickel-Chromium
• Classification: Alloy Traget
• Model NO.: CYT-NiCr
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

PRODUCT DESCRIPTION

The nickel-chromium rotating target is made using vacuum melting technology or thermal and cold spraying technology, with dimensions customized according to customer requirements.

The nickel-chromium flat target is produced using vacuum melting, rolling, machining, and other processes, with dimensions customized according to customer requirements.

TECHNICAL PARAMETERS

Purity: 99.9%; common ratio: 80-20Cr wt%, 60-40Cr wt%.

Applications: Large-area glass coating, automotive decoration coating, resistive coating, magnetic recording, integrated circuits, etc. In the coating industry, Ni-Cr binary alloy targets and films are widely used.

Used for wear-resistant, anti-friction, heat-resistant and corrosion-resistant surface strengthening films, as well as low-emissivity (Low-E) glass, microelectronics, magnetic recording, semiconductors, thin film resistors and other high-end technology industries, heat treatment processes

The art significantly affects the phase structure and microstructure of the alloy.
We can make flat nickel-chromium and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 3N high-purity nickel-chromium as below:

Targets Specification
Application	PVD sputtering materials
Material	nickel-chromium
Purity	3N~5N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	8.4g/cm3
Melting Point	3578ºC
Produce method	HIP

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray