3n5 High Purity Molybdenum Flat Sputtering Target

• Application: Industrial
• Formula: Molybdenum
• Classification: Metal Traget
• Model NO.: CYT-Mo
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

Molybdenum is a silver-white metal that is hard and tough, with a high melting point and high thermal conductivity. It does not react with air under normal temperature. As a transition element, it is extremely easy to change its oxidation state, and the color of molybdenum ions will also change with the change of oxidation state. Molybdenum is an essential trace element for human and animals as well as plants, playing an important role in their growth, development, and genetics. Due to its advantages of high strength, high melting point, corrosion resistance, wear resistance, etc., molybdenum is widely used in steel, oil, chemicals, electrical and electronic technology, medicine, and agriculture.

In the electronic industry, the application of molybdenum sputtering targets mainly focuses on flat panel displays, thin-film solar cell electrodes and wiring materials, as well as semiconductor barrier layer materials. Molybdenum has high melting point, high electrical conductivity, good corrosion resistance and other characteristics. Moreover, its specific resistivity and film stress are only half of that of chromium. Additionally, molybdenum is an environmentally friendly material that does not require concerns about environmental pollution. Therefore, molybdenum has become one of the preferred materials for sputtering targets in flat panel displays. Adding molybdenum to LCD elements can greatly improve the brightness, contrast, color and lifespan of LCDs. In addition, molybdenum targets are one of the core materials in the semiconductor industry. More specifically, they are key core raw materials in liquid crystal flat panel displays.

We can make flat Molybdenum targets and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 3N5 high-purity Molybdenum target as below:
  

Targets Specification
Application	PVD sputtering materials
Material	Molybdenum
Purity	3N5
Size	customized
Thickness	customized
Shape	Flat sputtering Target, Ring Type,Planar Type
Density	10.2g/cm3
Melting Point	2610ºC
Produce method	HIP

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Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al	3N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP,Smelting
Cu	4N	-	8.9	1084	400	16.5	Smelting
Ni	3N5	-	4.5	1453	90	13	Smelting
Ti	3N	-	4.5	1668	15.2	9.4	Smelting
Zr	3N	-	6.49	1852	0.227	-	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
Ag	4N	-	10.49	961.93	429	19	Smelting
C	4N	-	2.23	3850±50	151	-	HIP
TiAl	3N5	AS REQUESTED	-	-	-	-	Smelting
InSn	4N	AS REQUESTED	-	-	-	-	Casting
CrSi	4N	AS REQUESTED	-	-	-	-	Spray
CrW	4N	AS REQUESTED	16.7	3017	57	6.3	HIP
NiCr	3N	AS REQUESTED	-	-	-	-	Smelting
WC	3N	AS REQUESTED	15.77	2870	110	5.5	Sintering&Spray
NbOx	4N	AS REQUESTED	4.6	1460	5	1.5	Sintering&Spray