3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets

• Application: Industrial
• Formula: Rhodium
• Classification: Metal Traget
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Model NO.: CYT-TiCr
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

The chromium-titanium alloy target material is obtained by vacuum melting or fine grinding, mixing, and high-temperature pressing of high-purity chromium and titanium raw materials. The chromium-titanium alloy target material has high purity, low gas content, uniform composition distribution, and fine grain size. The chromium-titanium alloy has high hardness. The chromium-titanium series coating deposited by reacting with nitrogen has high hardness, smooth surface, good oxidation resistance, and is widely used in the field of tooling. The target material is used to react to generate a carbon-nitrogen-titanium-chromium coating, which is deposited on the surface of the golf ball head to obtain a pearl-like bright black surface appearance with good solvent resistance, wear resistance, impact resistance, and good metal adhesion. The coating has good comprehensive mechanical properties, with both toughness and hardness, which is very suitable for the use of golf ball heads.
We can make flat chromium-titanium and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 3N high-purity chromium-titanium as below:

Targets Specification
Application	PVD sputtering materials
Material	chromium-titanium
Purity	3N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	4.4-4.8g/cm3
Melting Point	1665-1750ºC
Produce method	melting and mixing

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Operation Process

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Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray