3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets

Product Details
Application: Industrial
Formula: Rhodium
Classification: Metal Traget
Gold Member Since 2023

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  • 3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
  • 3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
  • 3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
  • 3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
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Basic Info.

Model NO.
CYT-TiCr
Grade Standard
Industrial Grade
Certification
ISO
Shape
Rotary,Flat,Round
Transport Package
Wooden Box
Specification
Customized Size
Trademark
CANYUAN
Origin
China
Production Capacity
1000PCS

Product Description

3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating TargetsThe chromium-titanium alloy target material is obtained by vacuum melting or fine grinding, mixing, and high-temperature pressing of high-purity chromium and titanium raw materials. The chromium-titanium alloy target material has high purity, low gas content, uniform composition distribution, and fine grain size. The chromium-titanium alloy has high hardness. The chromium-titanium series coating deposited by reacting with nitrogen has high hardness, smooth surface, good oxidation resistance, and is widely used in the field of tooling. The target material is used to react to generate a carbon-nitrogen-titanium-chromium coating, which is deposited on the surface of the golf ball head to obtain a pearl-like bright black surface appearance with good solvent resistance, wear resistance, impact resistance, and good metal adhesion. The coating has good comprehensive mechanical properties, with both toughness and hardness, which is very suitable for the use of golf ball heads.
We can make flat chromium-titanium and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 3N high-purity
chromium-titanium as below:
 Targets Specification
Application PVD sputtering materials
Material chromium-titanium
Purity 3N
Size customized
Thickness customized
Shape Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density 4.4-4.8g/cm3
Melting Point 1665-1750ºC
Produce method melting and mixing

3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
Our Advantage
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets


Operation Process
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets

Packing Picture
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets


Application:
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets
3n, 56/44 Wt%, High Purity Titanium-Chromium Sputtering Target Flat Plate /Titanium-Chromium Rotating Targets

Relating Product
Material Purity
(N)
Components
(wt%)
Density Melting
 Point
Thermal
Conductivity
(Wm-1K-1)
Coefficient of
 expansion
(10-6k-1)
Production
 Process
Al-Alloy 5N - 2.7 660 235 23.1 Smelting
Cr 3N5 - 7.22 1907 94 4.9 HIP
Cu 4N - 8.9 1084 400 16.5 Smelting
Mo-alloy 3N5 - 10.28 2623 139 4.8 HIP
Nb 4N - 8.6 2477 54 7.3 Smelting
Ta 4N - 16.7 3017 57 6.3 Smelting
Si 4N - 2.33 1414 150 2.6 Sintering&Spray
TI 5N - 4.5 1670 22 8.6 Smelting
W 4N - 19.25 3422 174 4.5 HIP
AZO 3N5 98:2 5.6 1975 22 1.5 Sintering
ITO 4N 90:10 7.15 2000 15 2.0 Sintering
GZO 3N5 AS REQUESTED 7.15 - - - Sintering
IGZO 4N AS REQUESTED - - - - Sintering
NbOx 4N - 4.6 1460 5 1.5 Sintering&Spray
TIOx 4N - 4.23 1800 4 7.14 Sintering&Spray
 

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