99.99% High Purity Nb Niobium Sputtering Target Plate /Nb Niobium Metal Target

• Application: Industrial
• Formula: Niobium
• Classification: Metal Traget
• Model NO.: CYT-Nb
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

 Niobium is a rare, silvery-gray, soft, malleable metal with a high melting point. Niobium does not react with air at room temperature, and will not be completely oxidized when heated in oxygen. Niobium can directly combine with sulfur, nitrogen and carbon at high temperatures. Niobium does not react with inorganic acids or bases and is not soluble in aqua regia.Because niobium has good superconductivity, high melting point, corrosion resistance, wear resistance and other characteristics, it is widely used in steel, superconducting materials, aerospace, atomic energy and other fields.

Niobium and niobium alloy targets are mainly used in surface engineering materials, such as shipbuilding, chemical industry, liquid crystal display (LCD) and coating industries such as heat resistance, corrosion resistance and high conductivity, thin film solar industry, low-e glass industry, flat panel display industry, optical coating Industry etc. Nowadays, niobium sputtering targets are mainly used in surface coatings for advanced touch screens, flat panel displays and energy-saving glass. It can be used to make anti-reflective glass for touch screen panels.

Niobium can be made in planar and rotating type .Specifications and purity can be customized. The picture below is the composition analysis table of 3N5 high-purity niobium target:

Targets Specification
Application	PVD sputtering materials
Material	Niobium
Purity	4N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	8.57g/cm3
Melting Point	2477ºC
Produce method	HIP

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Operation Process

Packing Picture

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Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray