3n Nickel-Chromium-Silicon Rotating Targets/Flat Targets

• Application: Industrial
• Formula: Nickel-Chromium-Silicon
• Classification: Alloy Traget
• Model NO.: CYT-NiCrSi
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

PRODUCT DESCRIPTION

The nickel-chromium-silicon rotating target is produced by vacuum melting high-purity nickel, chromium, and silicon raw materials under high vacuum, refining, and casting to obtain a nickel-chromium-silicon alloy ingot. The resulting nickel-chromium-silicon alloy

It is made by thermal processing after thermal insulation of the ingot, and can also be made using thermal spraying technology. The size can be customized according to customer requirements.

The nickel-chromium-silicon flat target is produced by vacuum melting high-purity nickel, chromium, and silicon raw materials under high vacuum, refining, and casting to obtain a nickel-chromium-silicon alloy ingot. The resulting nickel-chromium-silicon alloy

It is made by thermal processing after heat preservation of the ingot, and the size is customized according to customer requirements.

TECHNICAL PARAMETERS

Purity: 99.9%

Application areas: display industry, solar energy industry, automotive industry and other industries.

Nickel-chromium-silicon alloy has high electrical resistivity, good surface oxidation resistance, high temperature resistance, and high strength at high temperatures. It has good processing properties and weldability, and can be widely used in metallurgy, chemical industry, and other fields.

Gold, household appliances, machinery manufacturing, etc. are used as heating elements, and electrical appliances are used as resistance materials.
We can make flat nickel-chromium-silicon and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 3N high-purity nickel-chromium-silicon as below:

Targets Specification
Application	PVD sputtering materials
Material	nickel-chromium-silicon
Purity	3N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	-g/cm3
Melting Point	-ºC
Produce method	HIP

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray