3n High Purity Titanium-Aluminum Sputtering Target Flat Plate / Titanium-Aluminum Rotating Targets

• Application: Industrial
• Formula: Titanium-Aluminum
• Classification: Alloy Traget
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Model NO.: CYT-AlTi
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

PRODUCT DESCRIPTION

The titanium-aluminum rotating target is produced using spraying or vacuum casting processes, and can produce a maximum length of 4000mm, with thickness and proportions customized according to customer requirements.

The titanium-aluminum planar target is produced using vacuum melting and casting technology (when the titanium atomic content is greater than or equal to 50%) or hot isostatic pressing technology, and can produce a maximum length of 1600mm, a maximum width of 400mm, and a size ratio of 1:1.

Example: Customized according to customer requirements.

TECHNICAL PARAMETERS

Purity: 99.8-99.99%; common ratio: 90-10Alwt%, 80-20Al wt%, 70-30 Alwt%, 50-50Alwt%, 40-60Al wt%, 33-67Al at% etc.

Application areas: decorative coating and tool coating, semiconductor electronics, cutting tools, carbide drills, carbide ceramic tools, carbide molds, as a hard coating.
We can make flat titanium-aluminum and rotary sputtering targets.
Specification and purity can be customized.
The description and composition analysis table of 3N high-purity titanium-aluminum  as below:

Targets Specification
Application	PVD sputtering materials
Material	titanium-aluminum
Purity	3N~5N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	-g/cm3
Melting Point	-ºC
Produce method	melting and mixing

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray