4n High Purity Au Gold Sputtering Target Plate /Au Metal Target

• Application: Industrial
• Formula: Gold
• Classification: Metal Traget
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Model NO.: CYT-AU
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

Gold is one of the monetary metals. Gold is solid at room temperature, has high density which is soft, bright and corrosion-resistant. It is the most malleable metal. Its ductility is second only to platinum and is one of the most malleable metals. Gold is widely used in the electronic industry, chemical industry, aerospace industry and traditional industries.

Gold sputtering targets are used in standard scanning electron microscope (SEM) coatings, and are also used to cover samples with a thin layer of conductive material. It can also be used for magnetron sputtering of semiconductors, displays, LEDs and photovoltaic devices, etc.
We can make flat Ni targets and rotary sputtering targets.
Specification and purity can be customized.
We can also make gold alloy targets, just as gold germanium targets and gold-tin alloy.
The description and composition analysis table of 4N high-purity gold target as below:
 

Targets Specification
Application	PVD sputtering materials
Material	Gold
Purity	4N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	10.5g/cm3
Melting Point	1064ºC
Produce method	HIP

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Operation Process

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Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al-Alloy	5N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP
Cu	4N	-	8.9	1084	400	16.5	Smelting
Mo-alloy	3N5	-	10.28	2623	139	4.8	HIP
Nb	4N	-	8.6	2477	54	7.3	Smelting
Ta	4N	-	16.7	3017	57	6.3	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
TI	5N	-	4.5	1670	22	8.6	Smelting
W	4N	-	19.25	3422	174	4.5	HIP
AZO	3N5	98:2	5.6	1975	22	1.5	Sintering
ITO	4N	90:10	7.15	2000	15	2.0	Sintering
GZO	3N5	AS REQUESTED	7.15	-	-	-	Sintering
IGZO	4N	AS REQUESTED	-	-	-	-	Sintering
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray
TIOx	4N	-	4.23	1800	4	7.14	Sintering&Spray