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Audited Supplier ITO target is a functional indium tin oxide ceramic material, which is used for deposition of ITO transparent conductive thin films with magnetron sputtering. It is produced by using the classic ceramic process at ambient pressure, in the form of tube/planar segments that are bonded into ITO target.
| Targets Specification | |
| Application | PVD sputtering materials |
| Material | ITO (In2O3:SnO2 =90:10) |
| Purity | 4N |
| Size | customized |
| Thickness | customized |
| Shape | Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type |
| Density | ≥7.13g/cm3 |
| Relative density (%) | ≥99.5 |
| Produce method | sintered |
| Material | Purity (N) |
Components (wt%) |
Density | Melting Point |
Thermal Conductivity (Wm-1K-1) |
Coefficient of expansion (10-6k-1) |
Production Process |
| Al-Alloy | 5N | - | 2.7 | 660 | 235 | 23.1 | Smelting |
| Cr | 3N5 | - | 7.22 | 1907 | 94 | 4.9 | HIP |
| Cu | 4N | - | 8.9 | 1084 | 400 | 16.5 | Smelting |
| Mo-alloy | 3N5 | - | 10.28 | 2623 | 139 | 4.8 | HIP |
| Nb | 4N | - | 8.6 | 2477 | 54 | 7.3 | Smelting |
| Ta | 4N | - | 16.7 | 3017 | 57 | 6.3 | Smelting |
| Si | 4N | - | 2.33 | 1414 | 150 | 2.6 | Sintering&Spray |
| TI | 5N | - | 4.5 | 1670 | 22 | 8.6 | Smelting |
| W | 4N | - | 19.25 | 3422 | 174 | 4.5 | HIP |
| AZO | 3N5 | 98:2 | 5.6 | 1975 | 22 | 1.5 | Sintering |
| ITO | 4N | 90:10 | 7.15 | 2000 | 15 | 2.0 | Sintering |
| GZO | 3N5 | AS REQUESTED | 7.15 | - | - | - | Sintering |
| IGZO | 4N | AS REQUESTED | - | - | - | - | Sintering |
| NbOx | 4N | - | 4.6 | 1460 | 5 | 1.5 | Sintering&Spray |
| TIOx | 4N | - | 4.23 | 1800 | 4 | 7.14 | Sintering&Spray |
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