4n 99.99% High Purity Indium Planar Sputtering Target for PVD Vacuum Coating

• Application: Industrial
• Formula: Indium
• Classification: Metal Traget
• Grade Standard: Industrial Grade
• Certification: ISO
• Shape: Rotary,Flat,Round
• Model NO.: CYT-In
• Transport Package: Wooden Box
• Specification: Customized Size
• Trademark: CANYUAN
• Origin: China
• Production Capacity: 1000PCS

Product Description

 

 

Chromium  Targets Specification
Application	PVD sputtering materials
Material	Indium
Purity	4N5
Size	customized
Thickness	customized
Shape	Rotary Chromium sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	7.31g/cm3
Melting Point	156.61ºC
Produce method	HIP

Chemical composition of Indium ingot
GRADE	chemical component%
	Indium≥	impurity content≤
	In	Cu	Pb	Zn	Cd	Fe	Ti	Sn	As	Ai	Bi
In99995	99.995	0.0005	0.0005	0.0005	0.0005	0.0005	0.0005	0.001	0.0005	0.0005	-
In9999	99.99	0.005	0.001	0.0015	0.0015	0.0008	0.0015	0.0015	0.0005	0.0007	-
In980	98	0.15	0.1	-	0.15	0.15	0.15	0.2	-	-	1.5

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al	3N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP,Smelting
Cu	4N	-	8.9	1084	400	16.5	Smelting
Ni	3N5	-	4.5	1453	90	13	Smelting
Ti	3N	-	4.5	1668	15.2	9.4	Smelting
Zr	3N	-	6.49	1852	0.227	-	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
Ag	4N	-	10.49	961.93	429	19	Smelting
C	4N	-	2.23	3850±50	151	-	HIP
TiAl	3N5	AS REQUESTED	-	-	-	-	Smelting
InSn	4N	AS REQUESTED	-	-	-	-	Casting
CrSi	4N	AS REQUESTED	-	-	-	-	Spray
CrW	4N	AS REQUESTED	16.7	3017	57	6.3	HIP
NiCr	3N	AS REQUESTED	-	-	-	-	Smelting
NiV	3N	97:3	-	-	-	-	Smelting
WC	3N	-	15.77	2870	110	5.5	Sintering&Spray
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray